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Fast lithographic source optimization method of certain contour sampling-Bayesian compressive sensing for high

Yiyu Sun, Yanqiu Li, Tie Li

    Optics Express
    |November 6, 2019
    PubMed
    Summary
    This summary is machine-generated.

    A new Certain Contour Sampling-Bayesian Compressive Sensing Source Optimization (CCS-BCS-SO) method enhances lithography. It achieves fast optimization and high pattern fidelity for advanced semiconductor manufacturing.

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    Area of Science:

    • Semiconductor Manufacturing
    • Computational Lithography
    • Optical Engineering

    Background:

    • Fast source optimization (SO) is critical for advanced semiconductor lithography at 14-5 nm nodes.
    • Previous compressive sensing (CS) SO methods using random sampling led to optimization failures and lower image fidelity.
    • Gradient-based SO with complete sampling (SD-SO) offers high fidelity but is computationally intensive.

    Purpose of the Study:

    • To develop a novel source optimization method that achieves both speed and high pattern fidelity simultaneously.
    • To address the limitations of existing fast SO methods in terms of reliability and accuracy.
    • To introduce Bayesian compressive sensing (BCS) theory into lithography resolution enhancement techniques (RETs).

    Main Methods:

    • Proposed a novel Certain Contour Sampling-Bayesian Compressive Sensing Source Optimization (CCS-BCS-SO) method.
    • Utilized Certain Contour Sampling (CCS) to ensure unique source optimization and reduce computational complexity.
    • Applied Bayesian Compressive Sensing (BCS) theory to lithography for the first time to enhance pattern fidelity.

    Main Results:

    • The CCS-BCS-SO method demonstrated simultaneous achievement of fast SO, comparable to CS-SO.
    • High pattern fidelity, similar to computationally intensive SD-SO, was achieved.
    • The CCS approach ensured unique source optimization and significantly reduced computational load.

    Conclusions:

    • CCS-BCS-SO successfully balances speed and fidelity in source optimization for advanced lithography.
    • The integration of BCS theory offers a promising approach for high-fidelity pattern generation in lithography systems.
    • This novel method provides a viable solution for on-line holistic lithography at critical nodes.