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Silicon-based film on the yttria-stabilized tetragonal zirconia polycrystal: Surface and shear bond strength analysis
Alecsandro de Moura Silva1, Viviane Maria Gonçalves de Figueiredo1, Marcos Massi2
1Department of Dental Materials and Prosthodontics, Institute of Science and Technology of Sao Jose dos Campos, São Paulo State University (UNESP), Sao Jose dos Campos, Brazil.
Aim:
To analyze the effect of a silicon (Si)-based film deposited on yttria-stabilized tetragonal zirconia polycrystal (Y-TZP) on the topography and bond strength of resin cement.
Methods:
Specimens of zirconia were obtained and randomly divided into 4 groups, according to surface treatment: polished group (PG) zirconia; sandblasted group (SG) zirconia with aluminum oxide (100 µm); after polished, zirconia was coated with Si-based film group (SiFG); and after sandblasted, zirconia was coated with Si-based film group (SiFSG). The Si-based films were obtained through plasma-enhanced chemical vapor deposition. Surface roughness and contact angle analysis were performed. Resin cement cylinders were built up on the treated surface of blocks, after applying Monobond-S. The specimens were submitted to thermocycling aging and shear bond strength testing. The Kruskal-Wallis and Mann-Whitney U-tests were performed.
Results:
There were significant differences between the surface treatments for each roughness parameter measured. Si-based film increased roughness and decreased the contact angle. Si-based film groups also demonstrated significantly lower bond strength values.
Conclusion:
Si-based film produced using plasma deposition provided lower bond strength to resin cement compared with conventional treatment; however, the film deposition reduced the contact angle and improved roughness, favorable properties in the long way to prepare an optimum material.
