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Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
Published on: May 23, 2018
Alkoxide ligand controlled self-assembling of (imido)vanadium(V) compounds having a tetrahedral VO3N geometry
Toshiyuki Moriuchi1, Takashi Sakuramoto1, Masafumi Nishina1
1Department of Applied Chemistry, Graduate School of Engineering, Osaka University, Yamada-oka, Suita, Osaka 565-0871, Japan.
Abstract:
The reaction of (1S,2S)-(-)-1,2-diphenylethylenediamine with VO(OiPr)3 in the presence of NaH was found to afford the binuclear (imido)vanadium(V) triisopropoxide, [(OiPr)3V(N-meso-1,2-DPE-N)V(OiPr)3] (DPE = diphenylethylene), (1aRS/SS). Using (1R,2R)-(+)-1,2-diphenylethylenediamine as a starting material, one-step reaction also proceeded to form the binuclear (imido)vanadium(V) triisopropoxide, [(OiPr)3V(N-meso-1,2-DPE-N)V(OiPr)3], (1aRS/RR). The single-crystal X-ray structure determination of 1aRS/SS revealed the hydrogen-bonded self-assembled structure utilizing the advantage of anti-conformation through the intermolecular hydrogen bonds of C-H···O pattern between phenyl and isopropoxide moieties, wherein each vanadium atom is coordinated in a nearly tetrahedral VO3N geometry (τ4 = 0.017 and 0.057). On the contrary, a discrete (imido)vanadium(V) tris(triphenylsiloxide) unit, which possesses a nearly tetrahedral VO3N arrangement around the vanadium metal center (τ4 = 0.060), was observed in the crystal structure of the (4-methoxyphenylimido)vanadium(V) tris(triphenylsiloxide), [(p-MeOC6H4N)V(OSiPh3)3], (1b) with bulky triphenylsiloxide ligands.
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