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Updated: Jun 28, 2026
Writing and Low-Temperature Characterization of Oxide Nanostructures
Published on: July 18, 2014
Temperature Dependence Of AOS Thin Film Nano Transistors For Medical Applications
Changhe Huo1,2, Mingzhi Dai2,3, Yongbin Hu4
1School of Materials Science and Engineering, Shanghai University, Shanghai 200444, People's Republic of China.
Background:
A novel temperature dependent amorphous nano oxide semiconductor (AOS) thin-film transistor (TFT) is reported here for the first time, which is vastly different from conventional behavior. In the literature, the threshold voltage of TFTs decreases with increasing temperature. Here, the threshold voltage increased at higher temperatures, which is different from previously reported results and was repeated on different samples.
Methods:
Electrical experiments (such as I-V measurements and photoelectron spectrometer experiments) were performed in order to explain such behavior. Double sweeping gate voltage measurements were performed to investigate the mechanism for the temperature dependent behavior.
Results:
It was found that there was a change of trap charge under thermal stress, which was released after the stress.
Conclusion:
Non-Arrhenius behaviors (including a linear behavior) were obtained for the amorphous nano oxide thin-film transistors within 303~425 K, suggesting their potential to be adjusted by measurement processes and be applied as temperature sensors for numerous medical applications.
