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Updated: Jan 2, 2026

Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding
Published on: January 9, 2014
Kodai Kishibe1, Soichiro Hirata1, Ryoichi Inoue1
1Department of Chemical Engineering, Kyoto University, Kyoto 615-8510, Japan.
A novel semiconductor wafer bonding method uses optical wavelength conversion materials for simultaneous bonding and interface functionalization. This cost-effective, room-temperature process enhances optoelectronic device performance and flexibility.
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