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Updated: Jan 2, 2026

Preparation of Macroporous Epitaxial Quartz Films on Silicon by Chemical Solution Deposition
Published on: December 21, 2015
Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism
Nina K Plugotarenko1, Tatiana N Myasoedova1, Mikhail N Grigoryev2
1Institute of Nanotechnologies, Electronics and Equipment Engineering, Southern Federal University, Chekhov str. 2, 347928 Taganrog, Russia.
Abstract:
Silicon-carbon films have been deposited on silicon and Al2O3/Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively. Moreover, the nucleation and growth mechanism of the films were studied from the experimental current transients.

