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The Material Efforts for Quantized Hall Devices Based on Topological Insulators
Fucong Fei1, Shuai Zhang1, Minhao Zhang1
1National Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, School of Physics, Nanjing University, Nanjing, 210093, China.
Abstract:
A topological insulator (TI) is a kind of novel material hosting a topological band structure and plenty of exotic topological quantum effects. Achieving quantized electrical transport, including the quantum Hall effect (QHE) and the quantum anomalous Hall effect (QAHE), is an important aspect of realizing quantum devices based on TI materials. Intense efforts are made in this field, in which the most essential research is based on the optimization of realistic TI materials. Herein, the TI material development process is reviewed, focusing on the realization of quantized transport. Especially, for QHE, the strategies to increase the surface transport ratio and decrease the threshold magnetic field of QHE are examined. For QAHE, the evolution history of magnetic TIs is introduced, and the recently discovered magnetic TI candidates with intrinsic magnetizations are discussed in detail. Moreover, future research perspectives on these novel topological quantum effects are also evaluated.
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