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Related Experiment Video

Updated: Jan 1, 2026

Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
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Low loss CMOS-compatible silicon nitride photonics utilizing reactive sputtered thin films.

Andreas Frigg, Andreas Boes, Guanghui Ren

    Optics Express
    |December 28, 2019
    PubMed
    Summary

    Low-loss silicon nitride (SiN) thin-films deposited via reactive sputtering offer a promising alternative to PECVD for photonic chips. This method achieves lower optical losses, enabling advanced hybrid integration for telecommunications.

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    Area of Science:

    • Materials Science
    • Photonics
    • Chemical Engineering

    Background:

    • Low-temperature silicon nitride (SiN) thin-film deposition is crucial for multi-layer photonic chips and hybrid integration.
    • Plasma-enhanced chemical vapor deposition (PECVD) is common but can lead to high optical losses at C-band wavelengths due to hydrogen bonds.

    Purpose of the Study:

    • To present a low-loss SiN platform for telecommunication applications using reactive sputtering at temperatures below 400°C.
    • To demonstrate the potential of reactive sputtered SiN as an alternative to PECVD for optical applications.

    Main Methods:

    • Developed a back-end-of-line (< 400°C) SiN deposition process using reactive sputtering.
    • Fabricated and characterized optical waveguides to measure propagation losses at telecommunication wavelengths.

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    Last Updated: Jan 1, 2026

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    Main Results:

    • Achieved low waveguide losses of 0.8 dB/cm at 1550 nm and 0.6 dB/cm at 1580 nm.
    • Observed that losses in moderately confined waveguides were primarily limited by patterning, not material properties.
    • Demonstrated lower optical losses compared to traditional PECVD SiN thin-films.

    Conclusions:

    • Reactive sputtered SiN thin-films offer a viable low-loss material for telecommunication photonic integrated circuits.
    • This technology shows significant promise for future hybrid integration platforms, including high Q resonators, optical filters, and delay lines.