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Solution Processable CrN Thin Films: Thickness-Dependent Electrical Transport Properties.

Zhenzhen Hui1, Xuzhong Zuo2, Longqiang Ye1

  • 1College of Chemistry and Materials Engineering, Anhui Science and Technology University, Fengyang 233100, China.

Materials (Basel, Switzerland)
|January 23, 2020
PubMed
Summary

Controlling chromium nitride (CrN) thin film thickness tunes microstructure and electrical properties. Thicker films show increased grain size and nitrogen content, leading to lower resistivity and magnetoresistance, with potential for sensitive magnetic field detection.

Keywords:
chemical solution depositionchromium nitrideelectrical transport propertiesthickness-dependentthin films

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Area of Science:

  • Materials Science
  • Condensed Matter Physics
  • Thin Film Technology

Background:

  • Transition-metal nitride thin films are crucial for controlling microstructures and physical properties.
  • Chromium nitride (CrN) is a material with potential applications in electronics and spintronics.
  • Film thickness is a key parameter influencing the properties of thin films.

Purpose of the Study:

  • To investigate the influence of thickness on the microstructure and electrical transport behavior of CrN thin films.
  • To explore the potential of CrN thin films for applications requiring high sensitivity to magnetic fields.

Main Methods:

  • CrN thin films with thicknesses ranging from 26 to 130 nm were synthesized using chemical solution deposition.
  • Microstructural characterization and electrical transport properties were analyzed as a function of film thickness.
  • Resistivity measurements were conducted across a temperature range of 5–350 K, including temperatures above and below the Néel temperature.

Main Results:

  • Films were pure phase, polycrystalline, with increasing grain size and nitrogen content correlating with increased thickness.
  • Resistivity, zero-field sensitivity, and magnetoresistance decreased with increasing film thickness.
  • All samples exhibited semiconductor-like properties; resistivity was modeled by thermal activation and two-dimensional weak localization (2D-WL) models.
  • Ultra-low magnetoresistance and high zero-field sensitivity (10⁻² K⁻¹ at 5 K) were observed in CrN films, tunable via thickness control.

Conclusions:

  • Film thickness is a critical factor for tailoring CrN microstructure and electrical properties.
  • Controlled thickness enables optimization of CrN thin films for sensitive magnetic field detection applications.
  • The observed semiconductor-like behavior and tunable magnetoresistance highlight the potential of CrN for advanced electronic devices.