Silicon nanowire core-shell PN junction phototransistors by self-assembled monolayer doping

Nanoscale photoconductors often have extremely high gain in quantum efficiency but suffer from the difficulty to design the density of surface states that cause the high photogain. In this Letter, we created high-gain photoconductors by forming a core-shell PN junction in silicon nanowires via self-assembled molecular monolayer doping. The highly doped n-type shell deactivates all the surface states by filling with electrons so that the n-type shell as a well, instead of the surface states, captures and emits photogenerated minority electrons under ON/OFF light illumination. The corresponding excess majority holes are accumulated in the nanowire channel and thus modulate the channel width, resulting in the experimentally observed high photogain (∼10⁸). The photoresponses of these phototransistors were systematically investigated as a function of the nanowire width and light illumination intensity. The results show that the nanowire channel is pinched off for the nanowires narrower than 73 nm due to the core-shell PN junction. We further derived analytical equations based on the PN junction device principle, finding the explicit gain equation that governs the photogain as a function of light intensity and other physical parameters of the nanowires. The explicit gain equations can fit well with the experimental data and allow us to design the core-shell nanowire phototransitors with desired performance.