Preparation of 1-D Nanostructured Tungsten Oxide Thin Film on Wire Mesh by Flame Vapor Deposition Process

Flame vapor deposition (FVD) process can be used to prepare the tungsten oxide thin film which has photocatalytic activity at visible light. The FVD process is fast and economical to prepare thin film on substrate comparing to other processes. Various nanostructured thin films could be easily prepared by controlling several process parameters in FVD. One-dimensional (1-D) nanostructures with high surface area also can be prepared reproducibly. The tungsten wire precursor was oxidized and vaporized in flame to be deposited onto the substrate. The nanostructure shapes can be adjusted by controlling nucleation and growth rates of tungsten oxide vapor on substrate. In this study, nanostructured tungsten oxide thin film was fabricated on stainless steel mesh by FVD process changing the process variables of FVD. We found that proper selection of suitable process conditions in FVD was quite important for the 1-D nanostructure growth on stainless steel wire mesh with high surface area, which is quite important for photocatalytic application.