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Updated: Dec 30, 2025

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

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γ-Radiation and H2O2 induced oxidative dissolution of uranium(iv) oxide in aqueous solution containing phthalic acid

Yuta Kumagai1, Mats Jonsson

  • 1Nuclear Science and Engineering Center, Nuclear Science Research Institute, Japan Atomic Energy Agency, 2-4 Shirane Shirakata, Tokai-mura, Naka-gun, Ibaraki 319-1195, Japan. kumagai.yuta@jaea.go.jp.

Dalton Transactions (Cambridge, England : 2003)
|January 24, 2020
PubMed

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