Synthesis of High-Quality Monolayer MoS₂ by Direct Liquid Injection

We report the synthesis of high-quality single monolayer MoS₂ samples using a novel technique that utilizes direct liquid injection (DLI) for the delivery of precursors. The DLI system vaporizes a liquid consisting of a selected precursor dissolved in a solvent into small, micron-sized droplets in an expansion chamber maintained at a selected temperature and pressure, before delivery to the deposition chamber. We demonstrate the synthesis of monolayer MoS₂ on SiO₂/Si substrates using the DLI technique with film quality superior to exfoliated samples or those grown by traditional tube furnace chemical vapor deposition (CVD) methods. Photoluminescence measurements of DLI monolayers exhibit consistently brighter emission, narrower line width, and higher emission energy than their exfoliated and CVD counterparts. Conductive atomic force microscopy identifies a defect density of 8.3 × 10¹¹/cm² in DLI MoS₂, lower than the measured density in CVD material and nearly an order of magnitude improvement over the exfoliated MoS₂ investigated under the same conditions. The DLI method is directly applicable to many other van der Waals materials, which require the use of challenging low vapor pressure precursors, to the growth of alloys, and sequential growths of dissimilar materials leading to van der Waals heterostructures.