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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
Observation of the hot-phonon effect in monolayer MoS2
Zhen Chi1,2, Hailong Chen2,3, Qing Zhao1
1Center for Quantum Technology Research, School of Physics, Beijing Institute of Technology, Beijing 100081, People's Republic of China.
Abstract:
Femtosecond transient absorption measurements have been performed to study the pump wavelength- and fluence-dependent hot carrier relaxation dynamics in monolayer MoS2. The relaxation process of the photoinduced carriers monitored within hundreds of femtoseconds after photoexcitation is demonstrated to be achieved through the carrier-phonon scattering mechanism. It is observed that an efficient hot-phonon effect can slow down the relaxation rate by around three times with the injected carrier density changing from 1 × 1012 to 3 × 1013 cm-2. A pronounced increase in the hot carrier relaxation time with decreasing temperature is further detected, which is attributed to the decreased phonon occupancy at lower temperature.
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