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Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

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Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
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The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
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Operating a cesium sputter source in a pulsed mode.

J Blahins1, T Leopold2, A Apsitis1

  • 1National Scientific Platform FOTONIKA-LV, University of Latvia, LV-1586 Riga, Latvia.

The Review of Scientific Instruments
|March 2, 2020
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Summary
This summary is machine-generated.

Pulsing a cesium sputter negative ion source significantly extends cathode lifetime and can enhance peak ion current for specific elements. This pulsed operation is valuable for studying short-lived or low-yield negative ions.

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Area of Science:

  • Atomic and Molecular Physics
  • Accelerator Physics

Background:

  • Cesium sputter negative ion sources are crucial for various applications.
  • Continuous wave (DC) operation can lead to rapid cathode degradation, limiting experimental duration and material choices.
  • Studying photodetachment processes requires precise control over ion beam delivery.

Purpose of the Study:

  • To present a scheme for pulsing a cesium sputter negative ion source.
  • To evaluate the benefits of pulsed ion beams for photodetachment studies.
  • To assess the impact of pulsed operation on cathode lifetime and ion current.

Main Methods:

  • Periodically switching the high voltage of the cesium sputter negative ion source on and off.
  • Combining the pulsed ion beam with a pulsed laser (6 ns pulse length, 10 Hz repetition rate).
  • Comparing cathode lifetime and peak ion current in pulsed mode versus DC operation.

Main Results:

  • Pulsed mode operation increased cathode lifetime by two orders of magnitude compared to DC operation.
  • Peak ion current in pulsed mode showed strong species-dependent variations, with some elements exhibiting significant enhancement.
  • The effectiveness of pulsed mode for ion current enhancement varies by element.

Conclusions:

  • Pulsed operation of cesium sputter negative ion sources offers substantial advantages in cathode longevity.
  • This technique is particularly beneficial for experiments involving negative ions with short cathode lifetimes, expensive materials, or low intrinsic yields.
  • Pulsed ion beams enable efficient photodetachment studies by maximizing the use of the ion source during experimental runs.