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Intensity modulation based optical proximity optimization for the maskless lithography.

Jianghui Liu, Junbo Liu, Qingyuan Deng

    Optics Express
    |March 3, 2020
    PubMed
    Summary
    This summary is machine-generated.

    A new grayscale mask method optimizes optical proximity effect (OPE) in digital micromirror device (DMD) maskless lithography. This technique improves pattern accuracy, enhancing lithography quality and achieving higher fidelity in microfabrication processes.

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    Area of Science:

    • Optics and Photonics
    • Materials Science and Engineering
    • Microfabrication Technologies

    Background:

    • Digital micromirror device (DMD) based maskless lithography faces challenges with optical proximity effect (OPE).
    • OPE negatively impacts exposure patterns and reduces overall lithography quality.
    • Existing methods struggle to effectively mitigate OPE in high-resolution patterning.

    Purpose of the Study:

    • To propose and evaluate a novel intensity modulation method for optimizing OPE in DMD maskless lithography.
    • To enhance the fidelity and accuracy of exposure patterns generated by DMD systems.
    • To demonstrate a practical approach for improving microfabrication quality using maskless techniques.

    Main Methods:

    • Implemented a digital grayscale mask, replacing the traditional binary mask, for intensity modulation.
    • Utilized pulse width modulation based image recognition for precise UV intensity control at a point-by-point level.
    • Employed image subtraction techniques to quantitatively analyze the effectiveness of the grayscale mask.

    Main Results:

    • The grayscale mask method significantly improved the consistency between the exposure pattern and the design pattern.
    • The matching rate between exposure and mask patterns increased from 78% to 91% with the proposed method.
    • Experimental validation confirmed the method's effectiveness in optical proximity optimization.

    Conclusions:

    • The proposed intensity modulation using a digital grayscale mask is a convenient and effective solution for OPE in DMD maskless lithography.
    • This technique offers a pathway to achieve high-fidelity patterns, crucial for advanced microfabrication.
    • The method demonstrates potential for widespread application in high-precision DMD-based manufacturing processes.