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Patterning nanoscale crossed grating with high uniformity by using two-axis Lloyd's mirrors based interference
Optics Express
|March 4, 2020
Summary
A novel two-axis Lloyd's mirrors interferometer enables high-throughput fabrication of uniform nanoscale crossed gratings. This system achieves precise patterning over large areas with a single exposure, optimizing optical interference for microfabrication applications.
Area of Science:
- Optics and Photonics
- Nanofabrication
- Materials Science
Background:
- Conventional methods for fabricating nanoscale crossed gratings often face limitations in uniformity, throughput, and area coverage.
- Achieving high-quality crossed gratings requires precise control over optical interference patterns.
Purpose of the Study:
- To theoretically investigate and experimentally construct a two-axis Lloyd's mirrors interferometer for large-area, high-uniformity nanoscale crossed grating fabrication.
- To analyze and mitigate unwanted interference effects in an optical patterning system.
- To achieve high-throughput fabrication of crossed gratings with sub-micron periods.
Main Methods:
- Development of a two-axis Lloyd's mirrors interferometer with orthogonal mirrors and a grating holder.
- Systematic analysis of beam non-orthogonality using a spatial full polarization tracing method.
- Optimization of exposure conditions to balance interference requirements and minimize unwanted reflections.
- Fabrication using microfabrication technology on a silicon substrate.
Main Results:
- Successful fabrication of crossed grating structures with periods of approximately 1076 nm (X-direction) and 1091 nm (Y-direction) over a 400 mm2 area.
- Achieved high uniformity with standard deviations in structure periods smaller than 0.3% along both directions.
- Demonstrated a single-beam, single-exposure scheme for efficient crossed grating patterning.
- Identified optimal exposure conditions by analyzing beam non-orthogonality without polarization modulation.
Conclusions:
- The orthogonal two-axis Lloyd's mirrors interferometer is an effective system for fabricating large-area, highly uniform nanoscale crossed gratings.
- Systematic analysis of non-orthogonality is crucial for optimizing interference and achieving desired grating patterns.
- The developed system offers a high-throughput and precise method for micro- and nanofabrication applications requiring crossed gratings.
