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Reflective aperiodic multilayer filters for metrology at XUV sources
Optics Express
|March 4, 2020
Summary
We developed a method to design XUV aperiodic multilayer mirrors that precisely mimic target spectra. This technique enables accurate spectral control for XUV optical systems and metrology applications.
Area of Science:
- Optics and Photonics
- Materials Science
- Spectroscopy
Background:
- XUV (extreme ultraviolet) optical systems require precise spectral control.
- Designing multilayer mirrors with specific spectral transmission is challenging.
- Existing methods may lack the flexibility to mimic complex target spectra.
Purpose of the Study:
- To present a general method for designing XUV aperiodic multilayer mirrors.
- To enable these mirrors to mimic a given target spectrum, such as the spectral transmission of an XUV optical system.
- To assess fabrication feasibility by minimizing layer thickness variations.
Main Methods:
- Minimizing a merit function to match multilayer reflectivity with a target spectrum.
- Utilizing fidelity parameters to quantify spectral matching.
- Developing strategies to reduce layer-to-layer thickness variations for fabrication.
Main Results:
- Demonstrated a design method for XUV aperiodic multilayer mirrors.
- Successfully mimicked a target spectrum of an EUV optical system (12 Mo/Si mirrors, 13.5 nm peak).
- Achieved high-fidelity spectral mimicry using a single reflection with filters or two reflections.
Conclusions:
- The developed method provides a general approach for designing XUV aperiodic multilayer mirrors.
- The technique is applicable for metrology at XUV sources, including spectrally accurate source imaging.
- The process can be adapted to mimic other narrowband, single-peaked XUV spectra.
