Related Experiment Video
Updated: Jul 28, 2026
12:35
Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
9.1K
Real-time Optical Dimensional Metrology via Diffractometry for Nanofabrication
Guy L Whitworth1,2, Achille Francone3, Clivia M Sotomayor-Torres3,4
1Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and BIST, Campus UAB, 08193, Bellaterra, Barcelona, Spain. guy.whitworth@icfo.eu.
Scientific Reports
|March 28, 2020
Summary
A new real-time optical scatterometry technique enables rapid, non-destructive dimensional metrology for surface patterning. This method is suitable for in-line quality control in nanoimprint lithography, meeting production demands.
Area of Science:
- Materials Science and Engineering
- Metrology and Measurement Science
- Nanotechnology and Microfabrication
Background:
- Surface patterning technologies are a rapidly growing industry, crucial for micro/nanoscale devices and smart surfaces.
- High-speed imprinting technologies necessitate advanced, rapid, and non-destructive dimensional metrology for quality control.
- Existing metrology techniques may not meet the speed and non-destructive requirements for large-area, high-throughput production.
Purpose of the Study:
- To introduce and validate a novel real-time optical scatterometry technique for mesoscale dimensional metrology.
- To demonstrate the applicability of this technique for in-line quality control in nanoimprint lithography.
- To provide a fast and non-destructive method for characterizing patterned surfaces.
Main Methods:
- Development of a real-time optical scatterometry system capable of analyzing multiple diffraction orders.
- Inspection of silicon gratings with varied structural parameters using the developed scatterometry technique.
- Cross-referencing scatterometry measurements with established techniques: Focused Ion Beam (FIB), Scanning Electron Microscopy (SEM), and scanning stylus profilometry.
Main Results:
- The optical scatterometry technique accurately measures dimensional parameters of patterned surfaces at the mesoscale.
- Measurements obtained via scatterometry show strong correlation with results from FIB, SEM, and profilometry.
- The method successfully monitored thermally imprinted structures across varying imprinting temperatures, demonstrating its utility.
Conclusions:
- The presented real-time optical scatterometry is a viable and effective technique for rapid, non-destructive dimensional metrology.
- This technique is well-suited for in-line quality control applications in high-speed nanoimprint lithography and surface patterning.
- The method offers a significant advancement in metrology for the growing surface patterning industry.
