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Related Experiment Video

Updated: Dec 25, 2025

Fabrication of 1-D Photonic Crystal Cavity on a Nanofiber Using Femtosecond Laser-induced Ablation
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Real-time Optical Dimensional Metrology via Diffractometry for Nanofabrication.

Guy L Whitworth1,2, Achille Francone3, Clivia M Sotomayor-Torres3,4

  • 1Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and BIST, Campus UAB, 08193, Bellaterra, Barcelona, Spain. guy.whitworth@icfo.eu.

Scientific Reports
|March 28, 2020
PubMed
Summary

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A new real-time optical scatterometry technique enables rapid, non-destructive dimensional metrology for surface patterning. This method is suitable for in-line quality control in nanoimprint lithography, meeting production demands.

Area of Science:

  • Materials Science and Engineering
  • Metrology and Measurement Science
  • Nanotechnology and Microfabrication

Background:

  • Surface patterning technologies are a rapidly growing industry, crucial for micro/nanoscale devices and smart surfaces.
  • High-speed imprinting technologies necessitate advanced, rapid, and non-destructive dimensional metrology for quality control.
  • Existing metrology techniques may not meet the speed and non-destructive requirements for large-area, high-throughput production.

Purpose of the Study:

  • To introduce and validate a novel real-time optical scatterometry technique for mesoscale dimensional metrology.
  • To demonstrate the applicability of this technique for in-line quality control in nanoimprint lithography.
  • To provide a fast and non-destructive method for characterizing patterned surfaces.

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Last Updated: Dec 25, 2025

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Main Methods:

  • Development of a real-time optical scatterometry system capable of analyzing multiple diffraction orders.
  • Inspection of silicon gratings with varied structural parameters using the developed scatterometry technique.
  • Cross-referencing scatterometry measurements with established techniques: Focused Ion Beam (FIB), Scanning Electron Microscopy (SEM), and scanning stylus profilometry.

Main Results:

  • The optical scatterometry technique accurately measures dimensional parameters of patterned surfaces at the mesoscale.
  • Measurements obtained via scatterometry show strong correlation with results from FIB, SEM, and profilometry.
  • The method successfully monitored thermally imprinted structures across varying imprinting temperatures, demonstrating its utility.

Conclusions:

  • The presented real-time optical scatterometry is a viable and effective technique for rapid, non-destructive dimensional metrology.
  • This technique is well-suited for in-line quality control applications in high-speed nanoimprint lithography and surface patterning.
  • The method offers a significant advancement in metrology for the growing surface patterning industry.