Design and development of an optical reflective notch filter using the ion assisted deposition technique with...

This paper presents research work about the design and fabrication of a 44-layer optical reflective notch filter. The performance of the fabricated notch filter was studied at normal (0°) and oblique (45°) incidence angle. In addition, the paper also discusses a three-layer broadband antireflective coating on both sides of the multilayer stack to suppress the ripples in the passband region. The thickness-modulated reflective stack of the filter was designed by using the materials Al₂O₃ (1.63) and SiO₂ (1.46). Optimization of the multilayer stack was carried out by using the damped least-squares algorithm. The theoretical and experimental results from the ion-assisted e-beam deposited samples for single notch reflective filters are presented. Good agreement in the design and experimental results was observed when the deposition process was controlled by time of evaporation. Further, the filter was characterized for the optical properties by using a UV-VIS-NIR spectrophotometer, surface morphology and protective properties using field emission scanning electron microscopy, a coherence correlation interferometer, and water contact angle.