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Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used....
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Cooling Rate Dependent Ellipsometry Measurements to Determine the Dynamics of Thin Glassy Films
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Parallel spectroscopic ellipsometry for ultra-fast thin film characterization.

Andrey Nazarov, Michael Ney, Ibrahim Abdulhalim

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    A new spectroscopic ellipsometer (SE) design eliminates mechanical parts for faster, more accurate thin-film characterization. This optical metrology tool achieves hundreds of measurements per second, ideal for dynamic processes in micro-electronics fabrication.

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    Area of Science:

    • Optical Metrology
    • Thin Film Characterization
    • Semiconductor Manufacturing

    Background:

    • Spectroscopic ellipsometry (SE) is crucial for thin film characterization and process monitoring.
    • Traditional SE systems use mechanical components (polarizers, phase modulators) limiting speed and accuracy.
    • Shrinking micro-electronics and increasing wafer sizes demand faster, more precise metrology tools.

    Purpose of the Study:

    • To propose and demonstrate a novel, high-speed spectroscopic ellipsometer design.
    • To overcome the limitations of mechanical rotation and serial phase modulation in conventional SE.
    • To enhance accuracy and acquisition rates for dynamic process monitoring.

    Main Methods:

    • Developed a fast SE design utilizing parallel snapshot detection.
    • Acquired three signals simultaneously at distinct polarization states.
    • Eliminated the need for mechanical rotation and serial phase modulation.

    Main Results:

    • The proposed SE design achieves acquisition rates of hundreds of measurements per second.
    • Demonstrated enhanced accuracy compared to traditional SE methods.
    • Successfully addressed the limitations of speed and error-proneness in dynamic processes.

    Conclusions:

    • The novel parallel snapshot SE offers a significant advancement in optical metrology.
    • This design is well-suited for the demands of modern micro-electronics fabrication.
    • Faster and more accurate thin-film characterization is now achievable for dynamic processes.