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Updated: Dec 25, 2025

Author Spotlight: Magnetometric Characterization of Intermediates in the Solid-State Electrochemistry of Redox-Active Metal-Organic Frameworks
Published on: June 9, 2023
Toward a quantitative analysis of the temperature dependence of electron attachment to SF6
John C Poutsma1, Nicholas S Shuman2, Thomas M Miller3
1Department of Chemistry, The College of William and Mary, Williamsburg, Virginia 23185, USA.
Abstract:
New flowing afterglow/Langmuir probe investigations of electronic attachment to SF6 are described. Thermal attachment rate constants are found to increase from 1.5 × 10-7 cm3 s-1 at 200 K to 2.3 × 10-7 cm3 s-1 at 300 K. Attachment rate constants over the range of 200-700 K (from the present work and the literature), together with earlier measurements of attachment cross sections, are analyzed with respect to electronic and nuclear contributions. The latter suggest that only a small nuclear barrier (of the order of 20 meV) on the way from SF6 to SF6 - has to be overcome. The analysis shows that not only s-waves but also higher partial waves have to be taken into account. Likewise, finite-size effects of the neutral target contribute in a non-negligible manner.
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