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Updated: Dec 24, 2025

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
Published on: November 9, 2015
Study of UV repetition laser-induced absorption on fused silica surface using a surface thermal lensing technique
Abstract:
A surface thermal lensing technique is used to study the time evolution of the absorption of a fused silica surface when exposed to UV pulsed laser irradiation in the nanosecond regime. The time evolution of the absorption is characterized as a saturated exponential increase, and the disruptive change indicates that the macrodamage occurs. A time-dependent absorption defect model is used to fit the experimental data, and a single-photon process is proposed to explain the results. This method can be used to estimate the operation lifetime of optical components.
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