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Fabrication and Characterization of the Barrier Film Having Excellent Moisture Barrier Characteristics Using
Sun Min Kim1, Hyun Chul Kim1, Jiwon Bang1
1Advanced Materials Convergence Division, Korea Institute of Ceramic Engineering and Technology (KICET), Jinju 52851, Korea.
Abstract:
Organic solar cell and OLED display devices are very sensitive to moisture, which leading to a fast degradation by the exposure to moisture and oxygen in the air. Therefore, in order to enhance the stability of the devices, a barrier film having WVTR (Water Vapor Transmission Rate) of 10-4 to 10-6 g/m²/day is required. In order to prepare the barrier film with excellent moisture blocking characteristics, perhydro polysilazane (PHPS) is used, which is developed to prepare an insulating film for semiconductors. Also a catalyst is added to lower the curing temperature to 100 °C or less. The result shows that the polysilazane is cured and converted to SiO₂ under 100 °C in 30 min. WVTR of the polysilazane coated film is estimated to be 2.1×10-2 g/m²/day. In addition, when the inorganic layer such as SiO₂ and Al₂O₃ is deposited on the planarization layer, the film shows excellent moisture blocking characteristics having WVTR to be 7.9×10-5 g/m²/day.
