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Updated: Dec 23, 2025

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
Published on: May 23, 2018
Oxidative Leaching Kinetics of Vanadium from the Vanadium-Chromium-Reducing Residue with K2Cr2O7
Hao Peng1, Qian Shang1, Ronghua Chen1
1Chongqing Key Laboratory of Inorganic Special Functional Materials, College of Chemistry and Chemical Engineering, Yangtze Normal University, Fuling, Chongqing 408100, P. R. China.
Abstract:
Oxidative-alkaline leaching of vanadium from vanadium-chromium-reducing residues with K2Cr2O7 was investigated in this paper. The effects of processing parameters including dosage of NaOH, dosage of K2Cr2O7, reaction time, and reaction temperature on the leaching efficiency of vanadium were studied. The results simulated by response surface methodology indicated that vanadium leaching was affected significantly by the dosage of K2Cr2O7 and NaOH, and the processing parameters that affected the leaching efficiency of vanadium followed the order m(NaOH)/m(residue) > m(K2Cr2O7)/sssssm(residue) > reaction temperature > reaction time. The leaching efficiency of vanadium was up to 99.92% under optimal conditions: reaction temperature of 90 °C, reaction time of 60 min, liquid-to-solid ratio of 5:1 mL g-1, m(K2Cr2O7)/m(residue) = 0.10, and m(NaOH)/m(residue) = 0.30. The kinetics analysis indicated that diffusion through the product layer was the controlling step and the apparent activation energy for vanadium leaching was calculated to be 58.275 kJ·mol-1.
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