Related Experiment Video
Updated: Dec 20, 2025

An Electrochemical Cholesteric Liquid Crystalline Device for Quick and Low-Voltage Color Modulation
Published on: February 27, 2019
Fast response of complementary electrochromic device based on WO3/NiO electrodes.
Po-Wen Chen1, Chen-Te Chang2, Tien-Fu Ko2
1Division of Physics, Institute of Nuclear Energy Research, Taoyuan County, 32546, Taiwan. powen@iner.gov.tw.
This study introduces nanoporous tungsten oxide/nickel oxide films synthesized via vacuum cathodic arc plasma (CAP) deposition for enhanced electrochromic devices (ECDs). The optimized films demonstrate excellent optical modulation and durability, paving the way for advanced smart window applications.
Area of Science:
- Materials Science
- Electrochemistry
- Nanotechnology
Background:
- Nanoporous structures enhance electrochromic performance by increasing surface area and facilitating ion/electron transfer.
- Tungsten oxide (WO3) and nickel oxide (NiO) are key materials for electrochromic devices (ECDs).
Purpose of the Study:
- To synthesize nanoporous WO3/NiO electrode films using vacuum cathodic arc plasma (CAP) deposition for complementary electrochromic devices (ECDs).
- To optimize electrochromic performance by controlling electrode structure and WO3 film thickness.
- To investigate the influence of WO3 film thickness on electrochemical and optical properties.
Main Methods:
- Fabrication of WO3/NiO electrode films on ITO glass using vacuum cathodic arc plasma (CAP) deposition.
- Construction of complementary electrochromic devices (ECDs) with the structure ITO/WO3/LiClO4-Perchlorate solution/NiO/ITO.
- Characterization of electrochemical properties (ion diffusion coefficients, charge capacity) and optical characteristics (optical modulation, switching times).
Main Results:
- Optimized 200-nm-thick WO3 films exhibited ion diffusion coefficients of 7.35 × 10^-10 cm²/s (oxidation) and 4.92 × 10^-10 cm²/s (reduction).
- The WO3 (200 nm)/NiO (60 nm) complementary electrode system showed 98% reversibility.
- A demonstration ECD achieved 46% optical modulation (ΔT) with switching times of 3.1 s (coloration) and 4.6 s (bleaching) at 633 nm.
- The ECD maintained 93% of its initial performance (43% ΔT) after 2500 cycles, indicating excellent durability.
Conclusions:
- Vacuum cathodic arc plasma (CAP) deposition is effective for synthesizing nanoporous WO3/NiO films for high-performance ECDs.
- WO3 film thickness significantly impacts electrochemical and optical properties, with 200 nm proving optimal in this study.
- The developed ECDs offer promising optical modulation, fast switching speeds, and exceptional long-term stability for applications like smart windows.
More Related Videos
05:47Preparation of Polyoxometalate-based Photo-responsive Membranes for the Photo-activation of Manganese Oxide Catalysts
Published on: August 7, 2018
09:22Synthesis and Performance Evaluations of ZnCoS/ZnCdS with Twin Crystal Structure for Multifunctional Redox Photocatalysis in Energy Applications
Published on: July 25, 2025