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Related Experiment Video

Updated: Dec 18, 2025

Gain-compensation Methodology for a Sinusoidal Scan of a Galvanometer Mirror in Proportional-Integral-Differential Control Using Pre-emphasis Techniques
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Method for compensation selection of a microlithographic optical system.

Xinfeng Yu

    Applied Optics
    |June 17, 2020
    PubMed
    Summary

    This study presents an effective method for selecting compensators in microlithographic optical systems to minimize aberrations. The approach optimizes compensator selection considering optomechanical constraints for improved alignment accuracy.

    Area of Science:

    • Optical Engineering
    • Computational Optics
    • Microlithography

    Background:

    • Microlithographic optical systems require precise alignment to correct construction imperfections and minimize aberrations.
    • The effectiveness of aberration correction heavily relies on the judicious selection of compensators.
    • Existing methods may not adequately address optomechanical constraints during compensator selection.

    Purpose of the Study:

    • To introduce an effective method for compensator selection in microlithographic optical systems.
    • To incorporate optomechanical constraints into the compensator selection process.
    • To minimize residual aberrations and compensator adjustment ranges simultaneously.

    Main Methods:

    • Developed a combinatorial optimization approach based on the linearity of compensators.

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  • Treated compensator selection as an optimization problem with dual objectives: minimizing residual aberrations and adjustment ranges.
  • Applied the method to a lithographic lens with a numerical aperture (NA) of 0.75.

    • Main Results:

    • The proposed method reliably identifies optimal compensator combinations under optomechanical constraints.
    • Compensators selected using the minimum objective function value resulted in reduced residual aberrations and adjustment ranges.
    • Demonstrated superior performance compared to selections with larger objective function values.

    Conclusions:

    • The presented method offers a robust solution for compensator selection in lithographic lenses.
    • This approach is applicable to other similar optical systems requiring precise aberration correction.
    • Effective compensator selection is crucial for achieving high-performance optical system alignment.