Mechanically adaptive implants fabricated with poly(2-hydroxyethyl methacrylate)-based negative photoresists

Baptiste Monney1, Allison E Hess-Dunning2, Paul Gloth2

  • 1Adolphe Merkle Institute, University of Fribourg, Chemin des Verdiers 4, CH-1700 Fribourg, Switzerland. christoph.weder@unifr.ch.

Summary

Researchers developed new mechanically adaptive polymers (MAPs) for neural implants using photolithography. These MAPs soften in the body, reducing tissue response and improving biocompatibility for safer brain-computer interfaces.

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