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    Pupil energy balance in immersion lithography is crucial for uniform exposure and pattern resolution. This study introduces a computational pupil compensation method using axicon lenses to improve lithographic performance.

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    Area of Science:

    • Optical Engineering
    • Lithography Technology

    Background:

    • Pupil energy imbalances in immersion lithography affect exposure uniformity and pattern resolution.
    • Large angles of incidence and offset imaging fields contribute to these imbalances.

    Purpose of the Study:

    • To investigate and propose a pupil compensation method for immersion lithography.
    • To enhance exposure uniformity and pattern resolution in lithographic processes.

    Main Methods:

    • A computational method utilizing constrained optimization was developed.
    • A self-designed optical model incorporating axicon lenses was employed for simulations.

    Main Results:

    • The proposed pupil compensation method was computationally designed and analyzed.
    • Simulations under various illumination settings validated the effectiveness of the compensation technique.

    Conclusions:

    • The developed computational pupil compensation method effectively addresses energy imbalances in immersion lithography.
    • This technique offers a viable solution for improving lithographic performance and pattern fidelity.