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Updated: Dec 16, 2025

Method to Visualize and Analyze Membrane Interacting Proteins by Transmission Electron Microscopy

Method to Visualize and Analyze Membrane Interacting Proteins by Transmission Electron Microscopy

Published on: March 5, 2017

Nanostructured-membrane electron phase plates.

Yujia Yang¹, Chung-Soo Kim¹, Richard G Hobbs²

¹Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA 02139, United States.

Ultramicroscopy

|July 6, 2020

Summary

This summary is machine-generated.

Researchers developed large-area electron phase plates using electron-beam lithography. These novel phase plates enable wavefront shaping for advanced electron microscopy and offer tunable diffraction efficiency for new imaging techniques.

Keywords:

Beam shaping Electron Diffraction Nanofabrication Phase plates electron optics

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Last Updated: Dec 16, 2025

Method to Visualize and Analyze Membrane Interacting Proteins by Transmission Electron Microscopy

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Published on: March 5, 2017

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Electrophoretic Crystallization of Ultrathin High-performance Metal-organic Framework Membranes

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Published on: August 16, 2018

Area of Science:

Materials Science
Nanotechnology
Electron Optics

Background:

Electron beams can be phase-modulated by nanostructured materials for applications in microscopy and lithography.
Conventional fabrication methods like focused-ion-beam-milling limit the size and throughput of electron phase plates.

Purpose of the Study:

To develop a scalable fabrication method for large-area electron phase plates.
To demonstrate the functionality of these phase plates in controlling electron wavefronts.

Main Methods:

Fabrication of large-area electron phase plates using electron-beam lithography and reactive-ion-etching.
Characterization via electron diffraction in transmission electron microscopes and diffractive imaging in a scanning electron microscope.

Main Results:

Successfully fabricated large-area electron phase plates.
Demonstrated phase modulation capabilities through electron diffraction patterns.
Observed a null in the bright-field image due to coherent interference of diffracted beams.
Achieved tunable diffraction efficiency.

Conclusions:

Electron-beam lithography and reactive-ion-etching offer a high-throughput method for fabricating electron phase plates.
The fabricated phase plates enable precise electron wavefront shaping.
The demonstrated nullification of the direct beam and tunable diffraction efficiency open avenues for novel dark-field electron microscopy techniques.