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High-performance sub-wavelength grating-based resonator sensors with substrate overetch.

Enxiao Luan, Kashif M Awan, Karen C Cheung

|July 7, 2020

Summary

We developed a substrate-overetch (SOE) geometry to boost sub-wavelength-grating (SWG) waveguide sensor performance. This new design significantly enhances analyte interaction and sensitivity for improved sensing applications.

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Area of Science:

Photonics and Sensing Technology
Materials Science and Engineering

Background:

Sub-wavelength-grating (SWG) waveguides are crucial for advanced sensor designs.
Improving the sensitivity and analyte interaction of SWG waveguide sensors remains a key challenge.

Purpose of the Study:

To propose and validate a novel substrate-overetch (SOE) geometry for enhancing SWG waveguide sensor performance.
To investigate the impact of SOE on analyte interaction and group index for improved sensitivity.

Main Methods:

Fabrication of the SOE-SWG waveguide using Ar/C4F8/O2 plasma etching.
Achieving a 285-nm anisotropic overetch in the SiO2 layer with high SiO2/Si selectivity (10:1).
Characterization of sensor performance using isopropyl alcohol solutions.

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Main Results:

The SOE-SWG waveguide demonstrated enhanced analyte interaction and a reduced group index.
Bulk sensitivity was significantly improved, reaching up to 575 nm/RIU (compared to 479 nm/RIU previously).
A maximum waveguide mode sensitivity exceeding one was achieved.

Conclusions:

The proposed SOE geometry offers a viable strategy for enhancing the sensing capabilities of SWG waveguide-based devices.
This advancement holds promise for developing more sensitive and efficient optical sensors.
The optimized etching process provides a pathway for fabricating high-performance SOE-SWG structures.