Atomic layer deposition for efficient oxygen evolution reaction at Pt/Ir catalyst layers.

Stefanie Schlicht1, Korcan Percin2, Stefanie Kriescher3

  • 1Friedrich-Alexander-Universität Erlangen-Nürnberg, Chair 'Chemistry of Thin Film Materials', IZNF, Cauerstr. 3, 91058 Erlangen, Germany.

Summary

Atomic layer deposition (ALD) offers superior performance for treating titanium felt electrodes in regenerative fuel cells and vanadium-air batteries compared to traditional dip-coating. ALD achieves higher mass activity and stability with less noble metal, enhancing energy storage technologies.

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