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Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments

Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments

Published on: February 27, 2013

Extreme ultraviolet microscope characterization using photomask surface roughness.

Gautam Gunjala¹, Antoine Wojdyla^2,3, Stuart Sherwin⁴

¹Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, Berkeley, CA, 94720, USA. ggunjala@berkeley.edu.

Scientific Reports

|July 17, 2020

Summary

This summary is machine-generated.

We developed a self-calibrating method to measure field-dependent aberrations in extreme ultraviolet microscopes using photomask blanks. This technique accurately characterizes aberrations across the field-of-view for in situ system analysis.

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Area of Science:

Optics and Photonics
Materials Science
Metrology

Background:

Characterizing aberrations in advanced imaging systems like extreme ultraviolet (EUV) microscopes is crucial for optimizing performance.
Existing methods often require specialized test objects or invasive hardware, limiting in situ applications.
Full-field synchrotron-based EUV microscopy presents unique challenges for aberration analysis due to its coherent illumination and large field-of-view.

Purpose of the Study:

To demonstrate a novel, self-calibrating computational method for characterizing field-dependent aberrations in EUV microscopes.
To establish a practical approach for in situ aberration measurement without custom test objects.
To assess the accuracy and applicability of the developed method across a significant field-of-view.

Main Methods:

Utilized the inherent atomic-scale roughness of standard photomask blanks as a calibration reference.
Developed a computational procedure to analyze images acquired during normal microscope operation.
Characterized aberrations across a 30-micrometer field-of-view, focusing on a central 5-micrometer area for detailed analysis.

Main Results:

Achieved a minimum aberration magnitude below [Formula: see text] averaged over the central 5-micrometer area.
Demonstrated measurement accuracy better than [Formula: see text].
Observed field variations in aberrations consistent with system geometry and prior measurements, validating the method's reliability.

Conclusions:

The developed method provides an effective and general approach for characterizing field-dependent aberrations in coherent imaging systems.
The technique's reliance on readily available photomask blanks and its non-invasive nature offer significant advantages for in situ microscope characterization.
Potential exists to recover illumination wavefront information from the same acquired images, further enhancing the method's utility.