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Freestanding nanowire arrays from soft-etch block copolymer templates
Edward J W Crossland1, Sabine Ludwigs1, Marc A Hillmyer1
1Department of Physics, Cavendish Laboratories, University of Cambridge, Cambridge, UKCB3 0HE and University of Cambridge Nanoscience Centre, 11 J. J. Thomson Avenue, Cambridge, UKCB3 0FF.
Soft Matter
|July 19, 2020
Summary
Researchers created freestanding copper oxide nanowires using a novel soft-etch method. This technique utilizes nanoporous polymer templates and offers a gentle approach for nanostructure fabrication.
Area of Science:
- Materials Science
- Nanotechnology
- Electrochemistry
Background:
- Block copolymers are versatile for creating nanoporous templates.
- Controlled degradation of polymer phases is key for nanostructure fabrication.
- Electric field alignment offers precise control over polymer film morphology.
Purpose of the Study:
- To develop a soft-etch method for preparing nanoporous templates.
- To fabricate freestanding copper oxide nanowires using these templates.
- To investigate factors influencing nanowire array formation.
Main Methods:
- Electric field alignment of poly(4-fluorostyrene)-b-poly(d,l-lactide) block copolymer films.
- Mild alkaline degradation of the polylactide phase to create nanopores.
- Electrochemical deposition of copper oxide within the nanoporous template.
- Template removal via dissolution or UV irradiation.
Main Results:
- Successfully prepared nanoporous poly(4-fluorostyrene) templates.
- Achieved electrochemical deposition of copper oxide nanowires.
- Obtained freestanding nanowire arrays after template removal.
- Identified annealing time, electric field strength, and removal method as critical parameters.
Conclusions:
- The soft-etch method is effective for creating sensitive nanostructures.
- Freestanding copper oxide nanowires can be fabricated with controlled parameters.
- This approach provides a versatile route for nanostructure synthesis.
