An on-demand bench-top fabrication process for fluidic chips based on cross-diffusion through photopolymerization
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Updated: Dec 14, 2025

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
Published on: January 27, 2017
Takumi Kimoto1, Kou Suzuki1, Takashi Fukuda2
1Graduate School of Science and Engineering, Doshisha University, 1-3 Tatara-Miyakodani, Kyotanabe, Kyoto 610-0321, Japan.
Abstract:
In this paper, we propose a novel approach to fabricate fluidic chips. The method utilizes molecular cross-diffusion, induced by photopolymerization under ultraviolet (UV) irradiation in a channel pattern, to form the channel structures. During channel structure formation, the photopolymer layer still contains many uncured molecules. Subsequently, a top substrate is attached to the channel structure under adequate pressure, and the entire chip is homogenously irradiated by UV light. Immediately thereafter, a sufficiently sealed fluidic chip is formed. Using this fabrication process, the channel pattern of a chip can be designed quickly by a computer as binary images, and practical chips can be produced on demand at a benchtop, instead of awaiting production in specialized factories.

