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Improved Graphene Blisters by Ultrahigh Pressure Sealing
Yolanda Manzanares-Negro1, Pablo Ares1, Miriam Jaafar1
1Departamento de Fı́sica de la Materia Condensada and Condensed Matter Physics Center IFIMAC. Universidad Autónoma de Madrid, 28049 Madrid, Spain.
ACS Applied Materials & Interfaces
|July 25, 2020
Summary
Researchers reduced gas leakage in graphene membranes by applying ultrahigh pressure to the graphene-silicon dioxide interface. This simple method enhances adhesion, improving graphene
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Graphene is a promising material for nanomechanical devices and membranes.
- Graphene blisters on silicon oxide (SiO2) microcavities serve as nanoactuators.
- Gas leakage at the graphene-SiO2 interface is a significant issue in these devices.
Purpose of the Study:
- To investigate air diffusion from pressurized graphene drumheads on SiO2 microcavities.
- To develop a method for improving graphene-SiO2 adhesion and reducing gas leakage.
- To enhance the performance of graphene as a gas membrane on SiO2 substrates.
Main Methods:
- Studying air diffusion in graphene drumheads on SiO2 microcavities.
- Applying controlled, localized ultrahigh pressure (>10 GPa) using an atomic force microscopy diamond tip.
- Analyzing the effect of pressure treatment on graphene-SiO2 interface sealing and leak rates.
Main Results:
- Ultrahigh pressure application significantly reduces gas leakage rates by up to approximately 4 times.
- The applied pressure brings the graphene layer closer to the SiO2 surface, enhancing their interaction.
- Improved sealing of the graphene-SiO2 interface was achieved, leading to lower leak rates.
Conclusions:
- A straightforward method using ultrahigh pressure can effectively improve graphene-SiO2 adhesion.
- This technique significantly reduces gas leakage rates in graphene-based nanoactuators and membranes.
- The findings offer a simple way to enhance the performance of graphene on technologically relevant SiO2 substrates.
