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    A new differential reflection (DR) method accurately measures transparent layer thickness, crucial for analyzing graphene. This improves graphene thickness accuracy on large-area substrates, advancing 2D material characterization.

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    Area of Science:

    • Materials Science
    • Optoelectronics
    • Nanotechnology

    Background:

    • Transparent layers are essential for optical contrast in graphene characterization.
    • Accurate thickness measurement of these layers is challenging, especially for large-area graphene.
    • Thickness uncertainty in transparent layers limits the analytical precision of graphene.

    Purpose of the Study:

    • To develop a novel method for accurate transparent layer thickness measurement.
    • To enhance the analytical accuracy of graphene thickness determination.
    • To provide a reliable technique for large-area two-dimensional material characterization.

    Main Methods:

    • Proposed a reference-aided differential reflection (DR) method utilizing a dual-light path.
    • Improved DR spectrum sensitivity with a designable reference for precise thickness determination.
    • Applied the method to centimeter-scale chemical-vapor-deposition-synthesized graphene on SiO2/Si substrates.

    Main Results:

    • Achieved 1 nm resolution in identifying the thickness of the underlying SiO2 layer using DR spectrum.
    • Deduced graphene thickness distribution with submonolayer resolution at a specific wavelength.
    • Validated results with ellipsometry and atomic force microscopy.

    Conclusions:

    • The reference-aided DR method accurately determines transparent layer thickness, ensuring graphene analysis precision.
    • This technique offers enhanced capabilities for measuring large-area two-dimensional materials.
    • The method provides an additional degree of freedom for differential reflection analysis.