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    We developed a new reflective wavefront sensor grating for high-power X-ray systems. This grating enables precise characterization of X-ray beamlines and optical components using glancing incidence angles.

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    Area of Science:

    • Optics and Photonics
    • X-ray Science and Technology
    • Metrology

    Background:

    • Characterizing high-power X-ray beamlines requires advanced optical tools.
    • Existing wavefront sensors may not be suitable for high power densities or glancing incidence angles.

    Purpose of the Study:

    • To demonstrate a novel reflective wavefront sensor grating.
    • To enable accurate characterization of high-quality X-ray beamlines and optical systems.

    Main Methods:

    • Designed and fabricated a deeply etched, two-level grating with shearing interferometry and Hartmann patterns.
    • Operated the grating at glancing incidence angles.
    • Performed surface characterization and soft X-ray reflectometry on a prototype.

    Main Results:

    • The grating demonstrated binary amplitude in reflection with high pattern contrast.
    • Surface characterization and soft X-ray reflectometry confirmed the prototype's functionality.
    • Simulations indicated effective device performance for wavefront measurement.

    Conclusions:

    • The reflective wavefront sensor grating is suitable for high-power X-ray applications.
    • The device enables precise wavefront measurements in challenging optical environments.
    • This technology advances the metrology capabilities for X-ray optics.