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Related Concept Videos

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The polymerization process that involves carbanion as an intermediate is called anionic polymerization. It is also a type of addition or chain-growth polymerization. Anionic polymerization gets initiated by a strong nucleophile such as an organolithium or a Grignard reagent. The most commonly used initiator for anionic polymerization is butyl lithium. Monomers involved in anionic polymerization must possess a vinyl group bonded to one or two electron-withdrawing groups. For instance,...
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The cationic polymerization mechanism consists of three steps: initiation, propagation, and termination. In the initiation step of the polymerization process, the π bond of a monomer gets protonated by the Lewis acid catalyst, which is formed from boron trifluoride and water. The protonation of the π bond generates a carbocation stabilized by the electron‐donating group. In the propagation step, the π bond of the second monomer acts as a nucleophile and attacks the...
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Development, Processing and Applications of a UV-Curable Polymer with Surface Active Thiol Groups.

Manuel Müller1, Rukan Nasri1, Lars Tiemann1

  • 1Center for Hybrid Nanostructures (CHyN), Institut für Nanostruktur- und Festkörperphysik (INF), Universität Hamburg, Luruper Chaussee 149, 22761 Hamburg, Germany.

Nanomaterials (Basel, Switzerland)
|September 17, 2020
PubMed
Summary
This summary is machine-generated.

We developed a novel UV-curable resist with surface thiol groups for micro/nanoscale patterning via nanoimprint lithography. This material enhances graphene device performance and enables straightforward surface chemistry modifications.

Keywords:
click chemistryformulation developmentnanoimprint lithographypolymersurface chemistry

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Polymer Chemistry

Background:

  • Developing advanced materials for micro/nanoscale fabrication is crucial.
  • Functional polymers are essential for modifying material properties and enabling specific applications.
  • Graphene-based electronics require precise surface engineering for optimal performance.

Purpose of the Study:

  • To introduce a novel UV-curable resist formulation with surface thiol groups.
  • To demonstrate its utility in micro/nanoscale patterning using UV nanoimprint lithography.
  • To showcase its application in enhancing graphene field-effect transistor (GFET) electrical properties.

Main Methods:

  • Formulation and characterization of a UV-curable resist.
  • Micro/nanoscale patterning using UV nanoimprint lithography.
  • Surface characterization using Raman spectroscopy and evaluation of hydrophilicity.
  • Demonstration of thiol-ene click chemistry for surface modification.
  • Integration into graphene devices to assess electrical property modulation.

Main Results:

  • The resist is UV curable and patternable at the micro/nanoscale.
  • The cured polymer exhibits high transparency and intrinsic hydrophilicity, which can be further enhanced.
  • Thiol groups are present on the surface and in the bulk, enabling straightforward thiol-ene click chemistry.
  • Preliminary etching rates and selectivity were measured.
  • The resist successfully improved the electrical properties of graphene devices for ambient condition operation.

Conclusions:

  • The novel resist formulation offers a versatile platform for micro/nanoscale fabrication with tunable surface properties.
  • The presence of surface thiol groups allows for facile functionalization via click chemistry.
  • This material demonstrates significant potential for improving the performance of graphene-based electronic devices.