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Updated: Dec 8, 2025

Building Langmuir Probes and Emissive Probes for Plasma Potential Measurements in Low Pressure, Low Temperature Plasmas
Published on: May 25, 2021
Kinetic modeling of the electric double layer at a dielectric plasma-solid interface
K Rasek1, F X Bronold1, H Fehske1
1Institut für Physik, Universität Greifswald, 17489 Greifswald, Germany.
We investigated plasma loss in dielectrics, finding that electron-hole recombination within the material forms an electric double layer. This layer influences plasma kinetics and material properties.
Area of Science:
- Plasma physics
- Materials science
- Semiconductor physics
Background:
- Collisionless plasmas interacting with dielectric surfaces.
- Electron and ion kinetics at material interfaces.
- Nonradiative electron-hole recombination in dielectrics.
Purpose of the Study:
- Investigate plasma loss kinetics in dielectrics.
- Analyze the formation of electric double layers at plasma-solid interfaces.
- Understand plasma-induced changes in dielectric charge carrier dynamics.
Main Methods:
- Solving coupled Boltzmann equations for plasma and solid charge carriers.
- Numerical simulation of transport phenomena.
- Analysis of potential, density, and flux profiles.
Main Results:
- Self-consistent electric double layer formation observed.
- Detailed profiles of plasma-dielectric interaction presented.
- Microscopic insights into plasma loss mechanisms derived from distribution functions.
Conclusions:
- Plasma loss is governed by internal recombination and electric double layer dynamics.
- The study provides a microscopic understanding of plasma-dielectric interactions.
- Numerical methods enable detailed analysis of complex kinetic processes.
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