Azopolymer-Based Nanoimprint Lithography: Recent Developments in Methodology and Applications

Nanofabrication on soft polymeric surfaces is an essential process in many fields, for example, chip manufacturing, microfluidics, high efficiency solar cells, and anticounterfeiting. In order to achieve these applications, various nanofabrication methods have been explored. Among them, nanoimprint lithography (NIL) has drawn worldwide attention because of its cheap and fast processability. In this minireview, an overview of azopolymer-based NIL is provided. Since their discovery, azopolymers have demonstrated versatile photoresponsive characteristics due to their unique physical and chemical properties that originate from the photoisomerization of azobenzene chromophores. As such, two aspects are reported in this minireview. On the one hand, various azopolymers showing photofluidization and photoswitchable glass transition temperatures have been developed, thus facilitating methodological advancements in NIL. On the other hand, these on-demand NIL methods provide greater opportunities for azopolymer-based applications, such as templating of optics, directional photo-manipulation of nanopatterns, and micro photo-actuators. Also the challenges are discussed that remain in this field.