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Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Wei-Hung Wu1, Jen-Chun Lee2, Yi-Ming Wang1
1Department of Mechatoronics Engineering, National Changhua University of Education, Changhua City 50007, Taiwan.
This study introduces a new deep learning model, Multi-scale ResNet (M-ResNet), for automatic metallographic defect detection. The M-ResNet achieves high accuracy, improving upon existing methods for analyzing metal and alloy structures.
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