Nanoscale patterning at the Si/SiO2/graphene interface by focused He+ beam

Artur Böttcher1, Ruth Schwaiger2,3, Tobias M Pazdera1

  • 1Institute of Physical Chemistry, Karlsruhe Institute of Technology (KIT), Fritz-Haber-Weg 2, D-76131, Karlsruhe, Germany.

Nanotechnology
|October 6, 2020
PubMed

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