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Updated: Dec 6, 2025

Fabrication of Micro-Patterned Chip with Controlled Thickness for High-Throughput Cryogenic Electron Microscopy
Published on: April 21, 2022
Meniscus-controlled printing of single-crystal interfaces showing extremely sharp switching transistor operation
Gyo Kitahara1, Satoru Inoue2, Toshiki Higashino3
1Department of Applied Physics, The University of Tokyo, Tokyo 113-8656, Japan. kitahara@hsgw.t.u-tokyo.ac.jp t-hasegawa@ap.t.u-tokyo.ac.jp.
We developed a novel technique to control solution menisci for manufacturing single-crystalline organic semiconductor films on highly lyophobic surfaces. This method enables the production of high-performance transistors with significantly improved switching characteristics.
Area of Science:
- Materials Science
- Organic Electronics
- Surface Science
Background:
- Meniscus shape is critical for solution-based thin-film processing.
- Uniform film growth is challenging on highly lyophobic surfaces, despite their potential for improved device performance.
Purpose of the Study:
- To demonstrate a technique for controlling solution menisci on highly lyophobic surfaces.
- To enable the fabrication of single-crystalline organic semiconductor (OSC) films on Cytop, a highly lyophobic material.
- To improve the performance of organic transistors by eliminating charge traps.
Main Methods:
- Utilizing a U-shaped metal film pattern on Cytop to initiate and sustain meniscus extension.
- Leveraging the growing edge of the OSC film to maintain meniscus stability during film growth.
- Fabricating organic semiconductor films and evaluating transistor performance.
Main Results:
- Successfully manufactured single-crystalline OSC films on the highly lyophobic Cytop surface.
- Achieved controlled and successive film growth by maintaining meniscus extension.
- Produced transistors with extremely sharp switching (subthreshold swing of 63 mV dec⁻¹).
Conclusions:
- The developed technique effectively controls solution menisci on challenging lyophobic surfaces.
- This method facilitates the production of high-quality OSC films and high-performance transistors.
- The technique holds potential for advancing the print production of functional electronic devices.
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