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A Fluorinated Thermocrosslinkable Organosiloxane: A New Low-k Material at High Frequency with Low Water Uptake
Fengping Liu1, Xingrong Chen1, Jiaren Hou1
1Key Laboratory of Synthetic and Self-Assembly Chemistry for Organic Functional Molecules, Center for Excellence in Molecular Synthesis, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, 345 Lingling Road, Shanghai, 200032, P. R. China.
Abstract:
In order to obtain low-k material with good comprehensive properties, a trifluoromethyl-containing organosiloxane with thermocrosslinkable vinyl and benzocyclobutene groups is designed and synthesized through the Piers-Rubinsztajn reaction. After treating at high temperature, the organosiloxane changed to form a cross-linked polysiloxane (called as c-FSi-BCB). c-FSi-BCB exhibits good dielectric properties with dielectric constant (Dk ) of 2.60 and dielectric loss (Df ) of 1.49 × 10-3 at a high frequency of 5 GHz. Importantly, c-FSi-BCB maintains such good dielectric properties and exhibits low water uptake of below 0.076%, even after immersing it in boiling water for 96 h. c-FSi-BCB also displays good thermostability with a 5% weight loss temperature (T5d ) of 453 °C. These data indicate that this fluorinated organosiloxane is suitable as the matrix resin for the fabrication of devices used in 5G communication.
