Impact of the process conditions on polymer pattern morphology during spin coating over topological surfaces

Micro and nanofabrication techniques depend on the technology of polymer film casting. Spin coating is a relatively robust method to develop uniform polymer films over the substrate surface. However, polymer casting over a topographically prepatterned surface using the spin coating technique is challenging because of the complex transport phenomena involved in the process. Apart from the substrate wettability and the polymer composition, the geometry of the substrate prepatterns affects the polymer phase separation characteristics and thus the morphology of the polymer pattern. In this work the phase separation dynamics during the spinodal decomposition of a polymer-solvent system in a spin coating process is mathematically investigated. The effect of the prepattern topography, substrate wettability, spin-coating rotational speed, and polymer composition on the phase separation dynamics is investigated. The results reveal that the periodicity and phase difference of the polymer peaks with the topography are dependent on the geometric parameters and substrate wettability. The impact of the rotational motion, on the polymer film, is restricted by the surface roughness (due to the topological prepatterns). On reducing the polymer fraction in the solution, the transition from a uniform coating to film defects to isolated patches (wetting to dewetting) occurs. The surface wettability plays a crucial role in topology directed dewetting, which is not observed in flat substrates.