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Near-field engineering for boosting the photoelectrochemical activity to a modal strong coupling structure
Yanfeng Cao1, Xu Shi, Tomoya Oshikiri
1Research Institute for Electronic Science, Hokkaido University, Sapporo, Japan. misawa@es.hokudai.ac.jp.
Abstract:
Near-field engineering is considered a significant strategy in constructing plasmonic nanostructures for efficient plasmonic chemistry. We demonstrate interfacial near-field engineering on a Au-NP/TiO2/Au-film (ATA) photoanode to improve the water oxidation efficiency. To tailor the near-field distribution, postdeposited Au on an ATA electrode (Au@ATA) is implemented using a facile constant potential electrolysis technique. As a result, the average photocurrent conversion efficiency of Au@ATA is approximately 1.3-fold higher than that of ATA.
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