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Coaxial spectroscopic imaging ellipsometry for volumetric thickness measurement
Applied Optics
|December 28, 2020
Summary
We developed a new spectroscopic imaging ellipsometry technique to measure spectral signals across an entire field of view instantly. This method enhances spatial resolution and accurately measures thin film thickness, validated against commercial ellipsometers.
Area of Science:
- Optics and Photonics
- Materials Science
- Metrology
Background:
- Ellipsometry is crucial for thin film characterization.
- Traditional methods often require slow scanning or complex polarization optics.
- A need exists for faster, high-resolution, and simplified ellipsometric measurements.
Purpose of the Study:
- To introduce a novel spectroscopic imaging ellipsometry technique.
- To achieve simultaneous, full-field spectral data acquisition.
- To enhance spatial resolution and simplify the measurement process.
Main Methods:
- Utilized a coaxial optical structure for high magnification.
- Encoded ellipsometric parameters into high-frequency spectral domain signals.
- Employed an imaging Michelson interferometer for data acquisition.
- Eliminated the need for polarization component operation during measurement.
Main Results:
- Successfully measured spectral ellipsometric signals across the entire field of view simultaneously.
- Achieved high spatial resolution due to the coaxial optical design.
- Validated volumetric thickness measurements of SiO2/Si samples against commercial ellipsometers.
Conclusions:
- The proposed spectroscopic imaging ellipsometry offers a significant advancement in thin film metrology.
- This technique enables rapid, high-resolution, and simplified spectral ellipsometric measurements.
- It provides accurate thickness determination, comparable to established methods.
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