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Published on: November 24, 2016
The Features of Phase Stability of GaN and AlN Films at Nanolevel
Ilya V Chepkasov1,2, Sergey V Erohin1,3, Pavel B Sorokin1,3
1National University of Science and Technology "MISIS", Leninsky Prospect 4, 119049 Moscow, Russia.
Abstract:
Recently, two-dimensional gallium and aluminum nitrides have triggered a vast interest in their tunable optical and electronic properties. Continuation of this research requires a detailed understanding of their atomic structure. Here, by using first-principles calculations we reported a systematic study of phase stability of 2D-GaN and 2D-AlN. We showed that the films undergo a phase transition from a graphene-like to a wurtzite structure with a thickness increase, whereas the early reported body-centered-tetragonal phase requires specific conditions for stabilization. Additionally, we studied how the functionalization of the surface can modify the film structure as exemplified by hydrogenation.

